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Influence of test capacitor features on piezoelectric and dielectric measurement of ferroelectric films

机译:测试电容器特性对铁电薄膜的压电和介电测量的影响

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This paper presents both theoretical and numerical analyses of the piezoelectric and dielectric responses of a highly idealized film-on-substrate system, namely, a polarized ferroelectric film perfectly bonded to an elastic silicon substrate. It shows that both effective dielectric arid piezoelectric properties of the films change with the size and configuration of the test capacitor. There exists a critical electrode size that is smaller than the diameter of the commonly used substrate. The effective film properties converge to their respective constrained values as capacitor size increases to the critical size. If capacitor size is smaller than the critical size, the surface displacement at the top electrode deviates from the: net thickness change in response to an applied voltage because the film is deformable at the film/substrate interface. The constrained properties of the films depend only on those of bulk ferroelectrics but are independent of film thickness and substrate properties. The finding of the critical capacitor size together with analytical expressions of the constrained properties makes it possible to realize consistent measurement of piezoelectric and dielectric properties of films. A surface scanning technique is recommended to measure the profile of piezoresponses of the film so that the constrained properties of the film can be identified accurately.
机译:本文介绍了高度理想化的基板上膜系统(即完全粘合到弹性硅基板上的极化铁电膜)的压电和介电响应的理论和数值分析。结果表明,薄膜的有效介电和压电性能都随测试电容器的尺寸和配置而变化。存在的临界电极尺寸小于常用基板的直径。当电容器尺寸增加到临界尺寸时,有效薄膜性能会收敛到它们各自的约束值。如果电容器的尺寸小于临界尺寸,则由于膜在膜/基底界面处可变形,因此上电极的表面位移会因施加的电压而偏离净厚度变化。膜的受约束性能仅取决于体铁电体的受约束性能,而与膜厚度和基底性能无关。临界电容器尺寸的发现以及受约束特性的解析表达式使得有可能实现对膜的压电和介电特性的一致测量。建议使用表面扫描技术来测量薄膜的压电响应曲线,以便可以准确识别薄膜的受约束性能。

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