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首页> 外文期刊>Ultrasonics, Ferroelectrics and Frequency Control, IEEE Transactions on >Tunable capacitors employing BZN/BST thin films for RF applications
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Tunable capacitors employing BZN/BST thin films for RF applications

机译:采用BZN / BST薄膜的可调谐电容器,用于RF应用

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摘要

Tunable parallel-plate capacitors employing Bi1.5Zn1.0Nb1.5O7/Ba0.5Sr0.5TiO3 (BZN/BST) thin films for RF applications are reported. The intermediate frequency measurements indicate that the BZN/BST-based varactors demonstrate large tunability of 39% at 40 V and high device quality factor of 300 at 1 MHz. The devices maintain quite low leakage current density even under a high applied bias. The quality factor analysis shows that the device quality factor is highly dependent on conductor loss of electrodes at frequencies above 1 MHz. The phase shifter employing BZN/BST-based varactors exhibits lower insertion loss than does employing semiconductor diodes at a designed frequency of 445 MHz, demonstrating the potential of tunable capacitors employing BZN/BST thin films for RF applications.
机译:采用Bi 1.5 Zn 1.0 Nb 1.5 O 7 / Ba 0.5 的可调平行板电容器报道了用于射频应用的sub> Sr 0.5 TiO 3 (BZN / BST)薄膜。中频测量结果表明,基于BZN / BST的变容二极管在40 V电压下具有39%的大可调性,在1 MHz频率下具有300的高器件品质因数。即使在较高的施加偏压下,该器件仍保持相当低的泄漏电流密度。品质因数分析表明,器件品质因数在很大程度上取决于频率高于1 MHz时电极的导体损耗。与采用半导体二极管的移相器相比,采用基于BZN / BST的变容二极管的设计频率为445 MHz,具有更低的插入损耗,这证明了采用BZN / BST薄膜的可调谐电容器在RF应用中的潜力。

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