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首页> 外文期刊>International Journal of Materials and Chemistry >Synthesis of Nanostructured Cu:As2S3 Thin Films by Chemical Bath Deposition Method and Their Physical Properties
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Synthesis of Nanostructured Cu:As2S3 Thin Films by Chemical Bath Deposition Method and Their Physical Properties

机译:化学浴沉积法合成纳米结构Cu:As 2 S 3 薄膜及其物理性质

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摘要

Metal chalcogenide thin film preparation by chemical bath deposition is currently attracting considerable attention as it is relatively less expensive, simple and convenient method for large area deposition. In the present work preparation of un-doped and Cu doped As2S3 thin films by chemical bath deposition method is reported. The film characterization is undertaken to study structural, optical and electrical properties of As2S3 and Cu:As2S3 thin films. The structural characterization shows mixed monoclinic and hexagonal lattice due to As2S3 and CuS.The electrical resistivity of the As2S3 film decreases with doping as it introduces the impurity donor level in As2S3. The activation energy and optical band gap decreases from 0.26 to 0.03 eV and 3 to 2.34 eV due to doping of Cu in As2S3 film respectively. The thermo-emf measurement confirms the n-type conductivity.
机译:通过化学浴沉积制备金属硫属化物薄膜目前受到相当大的关注,因为它相对便宜,简单且方便的大面积沉积方法。在目前的工作中,报道了通过化学浴沉积法制备未掺杂和掺杂Cu的As 2 S 3 薄膜。进行膜表征以研究As 2 S 3 和Cu:As 2 S 3 < / SUB>薄膜。由于As 2 S 3 和CuS的作用,结构表征显示出混合的单斜晶和六边形晶格。As 2 S 的电阻率3 薄膜随着掺杂而减少,因为它在As 2 S 3 中引入了杂质施主能级。分别由于As 2 S 3 薄膜中的Cu掺杂,活化能和光学带隙分别从0.26降低至0.03 eV和3降低至2.34 eV。热电动势测量证实了n型电导率。

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