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Electronic structures of oxygen-deficient Ta2O5

机译:缺氧Ta2O5的电子结构

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We provide a first-principles description of the crystalline and oxygen-deficient Ta 2O5 using refined computational methods and models. By performing calculations on a number of candidate structures, we determined the low-temperature phase and several stable oxygen vacancy configurations, which are notably different from the previous results. The most stable charge-neutral vacancy site induces a shallow level near the bottom of conduction band. Stability of different charge states is studied. Based on the results, we discuss the implications of the level structures on experiments, including the leakage current in Ta 2O5-based electronic devices and catalysts.
机译:我们使用改进的计算方法和模型提供了晶体和缺氧Ta 2O5的第一性原理描述。通过对许多候选结构进行计算,我们确定了低温相和几种稳定的氧空位构型,与先前的结果明显不同。最稳定的电荷中性空位会在导带底部附近感应出较浅的水平。研究了不同电荷状态的稳定性。基于结果,我们讨论了能级结构对实验的影响,包括基于Ta 2O5的电子器件和催化剂中的泄漏电流。

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