Graphene Etching: How Could It Be Etched? | Bentham Science

摘要

Background: A new nanomaterial species called “graphene” has been of great interest owingto its outstanding mechanical, thermal, chemistry, and physical characteristics. The etching eitherdirectly from chemical vapor deposition growth process or plasma technology process has beenemerging as attracting research topic in achieving the thinner graphene layer and cleaner surface inorder to improve their electronics and optoelectronics. The resided impurities and the high roughnesssurface are because of the nature of graphenes induced in deteriorating the performance. Removal ofthe impurities by surface cleaning or plasma-related graphene etching through the layer-by-layer thinningmethod as a top-down lithography. In particular, new plasma-based graphene etching is freedamagewhile maintaining its π-binding, which affects its conductivity.Objective: This mini-review will address the latest progress related to graphene etching technologybased on emerging strategies. From here, it might be adopted in the etching of other nanomaterials.