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Physical Investigations on ZnO:Ni Layers Deposited by Spray Pyrolysis

机译:喷雾热解沉积ZnO:Ni层的物理研究

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Nickel-doped ZnO (ZnO:Ni) layers have been deposited on glass substrates by a spray pyrolysis method using zinc acetate and nickel sulphate as precursors. The layers were grown at different substrate temperatures,Ts, that vary in the range 250–350°C. During deposition, the precursor concentration and Ni-doping content were maintained constant at 0.1 M and 10%, respectively. The X-ray diffraction (XRD) analysis showed that all the layers were polycrystalline in nature with the (002) plane as the preferred orientation and exhibited hexagonal wurtzite structure. A sharp increment in the intensity of predominant peak with the substrate temperature was observed consistently that indicated an improvement in the crystallinity of the layers. The Raman studies confirmed the hexagonal wurtzite crystal structure of ZnO and indicated defect states. The X-ray photoelectron spectroscopy (XPS) studies revealed the characteristic peaks of the elements involved in the films and their ionic states. The optical transmittance of the films was higher than 80% and the evaluated energy band gap decreased from 3.17 eV to 3.13 eV with the increase of substrate temperature.
机译:镍掺杂的ZnO(ZnO:Ni)层已通过使用乙酸锌和硫酸镍作为前体的喷雾热解法沉积在玻璃基板上。这些层是在不同的基板温度Ts下生长的,基板温度Ts在250–350°C的范围内变化。在沉积过程中,前驱体浓度和Ni掺杂含量分别保持恒定,分别为0.1 M和10%。 X射线衍射(XRD)分析表明,所有层本质上都是多晶的,以(002)面为优选取向,并表现出六方纤锌矿结构。始终观察到主要峰强度随衬底温度的急剧增加,这表明各层的结晶度有所改善。拉曼研究证实了ZnO的六方纤锌矿晶体结构并指出了缺陷状态。 X射线光电子能谱(XPS)研究揭示了薄膜中所涉及元素的特征峰及其离子态。薄膜的透光率高于80%,随着基底温度的升高,评估的能带隙从3.17 eV降低到3.13 eV。

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