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Electrostatic force microscopy and electrical isolation of etched few-layer graphene nano-domains

机译:静电力显微镜和电隔离蚀刻的几层石墨烯纳米域

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摘要

Nanostructured bi-layer graphene samples formed through catalytic etching are investigated with electrostatic force microscopy. The measurements and supporting computations show a variation in the microscopy signal for different nano-domains that are indicative of changes in capacitive coupling related to their small sizes. Abrupt capacitance variations detected across etch tracks indicates that the nano-domains have strong electrical isolation between them. Comparison of the measurements to a resistor-capacitor model indicates that the resistance between two bi-layer graphene regions separated by an approximately 10 nm wide etch track is greater than about with a corresponding gap resistivity greater than about . This extremely large gap resistivity suggests that catalytic etch tracks within few-layer graphene samples are sufficient for providing electrical isolation between separate nano-domains that could permit their use in constructing atomically thin nanogap electrodes, interconnects, and nanoribbons.
机译:通过静电力显微镜研究了通过催化蚀刻形成的纳米结构双层石墨烯样品。测量结果和支持计算结果表明,对于不同的纳米域,显微镜信号会发生变化,这表明与电容的小尺寸有关的电容耦合变化。跨蚀刻轨迹检测到的突然电容变化表明,纳米域在它们之间具有很强的电绝缘性。与电阻-电容器模型的测量结果比较表明,被约10μnm宽的蚀刻轨迹隔开的两个双层石墨烯区域之间的电阻大于,而相应的间隙电阻率大于。这种极高的间隙电阻率表明,在几层石墨烯样品中的催化蚀刻径迹足以在单独的纳米域之间提供电隔离,从而可以将其用于构造原子级薄的纳米间隙电极,互连体和纳米带。

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