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Coatings for FEL optics: preparation and characterization of B4C and Pt

机译:FEL光学镀膜:B4C和Pt的制备和表征

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摘要

Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordingly, surface finishing technology is now able to produce large substrate lengths with micro-roughness on the sub-nanometer scale. At the Helmholtz-Zentrum Geesthacht (HZG), a 4.5 m-long sputtering facility enables us to deposit a desired single-layer material some tens of nanometers thick. For the European XFEL project, the shape error should be less than 2 nm over the whole 1 m X-ray mirror length to ensure the safe and efficient delivery of X-ray beams to the scientific instruments. The challenge is to achieve thin-film deposition on silicon substrates, benders and gratings without any change in mirror shape. Thin films of boron carbide and platinum with a thickness in the range 30–100 nm were manufactured using the HZG sputtering facility. This setup is able to cover areas of up to 1500 mm × 120 mm in one step using rectangular sputtering sources. The coatings produced were characterized using various thin-film methods. It was possible to improve the coating process to achieve a very high uniformity of the layer thickness. The movement of the substrate in front of the sputtering source has been optimized. A variation in B4C layer thickness below 1 nm (peak-to-valley) was achieved at a mean thickness of 51.8 nm over a deposition length of 1.5 m. In the case of Pt, reflectometry and micro-roughness measurements were performed. The uniformity in layer thickness was about 1 nm (peak-to-valley). The micro-roughness of the Pt layers showed no significant change in the coated state for layer thicknesses of 32 nm and 102 nm compared with the uncoated substrate state. The experimental results achieved will be discussed with regard to current restrictions and future developments.
机译:在当今和未来的全球自由电子激光器(FEL)和同步加速器源中,光束传输都需要使用大型X射线镜。在过去的几十年中,对于由轻或重元素组成的单层长度达1μm的大型镜子的需求不断增长。因此,表面精加工技术现在能够以亚纳米级生产具有微粗糙度的大基板长度。在Helmholtz-Zentrum Geesthacht(HZG),一个4.5μm长的溅射设备使我们能够沉积几十纳米厚的所需单层材料。对于欧洲XFEL项目,在整个1µm X射线反射镜长度上,形状误差应小于2µnm,以确保将X射线束安全有效地传送到科学仪器。面临的挑战是如何在硅基板,弯曲机和光栅上实现薄膜沉积,而镜面形状没有任何变化。使用HZG溅射设备制造了厚度在30-100nm之间的碳化硼和铂薄膜。使用矩形溅射源,此设置能够一步一步覆盖最大1500 mm×120 mm的区域。使用各种薄膜方法对生产的涂层进行表征。可以改善涂覆过程以实现非常高的层厚度均匀性。衬底在溅射源前面的移动已得到优化。在1.5µm的沉积长度上,平均厚度为51.8µnm时,B4C层厚度在1µnm以下(峰谷之间)变化。在铂的情况下,进行了反射测量和微粗糙度测量。层厚度的均匀性约为1 nm(峰谷)。与未涂覆的衬底状态相比,对于32 nm和102 nm的厚度,Pt层的微观粗糙度在涂覆状态下没有显示出明显变化。将就当前的限制和未来的发展讨论所取得的实验结果。

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