首页> 中文期刊> 《光:科学与应用(英文版)》 >Diffraction-limited imaging with monolayer 2D material-based ultrathin flat lenses

Diffraction-limited imaging with monolayer 2D material-based ultrathin flat lenses

         

摘要

Ultrathin flat optics allow control of light at the subwavelength scale that is unmatched by traditional refractive optics.To approach the atomically thin limit,the use of 2D materials is an attractive possibility due to their high refractive indices.However,achievement of diffraction-limited focusing and imaging is challenged by their thickness-limited spatial resolution and focusing efficiency.Here we report a universal method to transform 2D monolayers into ultrathin flat lenses.Femtosecond laser direct writing was applied to generate local scattering media inside a monolayer,which overcomes the longstanding challenge of obtaining sufficient phase or amplitude modulation in atomically thin 2D materials.We achieved highly efficient 3D focusing with subwavelength resolution and diffractionlimited imaging.The high focusing performance even allows diffraction-limited imaging at different focal positions with varying magnifications.Our work paves the way for downscaling of optical devices using 2D materials and reports an unprecedented approach for fabricating ultrathin imaging devices.

著录项

  • 来源
    《光:科学与应用(英文版)》 |2020年第1期|696-706|共11页
  • 作者单位

    Centre for Translational Atomaterials;

    Faculty of Science;

    Engineering and Technology;

    Swinburne University of Technology;

    P.O.Box 218;

    Hawthorn;

    VIC 3122;

    Australia;

    Department of Materials Science and Engineering;

    ARC Centre of Excellence in Future Low-Energy Electronics Technologies(FLEET);

    Monash University;

    Wellington Road;

    Clayton;

    VIC 3800;

    Australia;

    School of Mathematical and Physical Sciences;

    Faculty of Science;

    University of Technology Sydney;

    15 Broadway;

    Ultimo;

    NSW 2007;

    Australia;

    Institute of Microscale Optoelectronics;

    Lab of Artificial Microstructure for Optoelectronics;

    Shenzhen University;

    518000 Shenzhen;

    China;

    School of Materials Science and Engineering;

    Nanyang Technological University;

    Singapore 639798;

    Singapore;

    Department of Chemistry;

    National University of Singapore;

    Singapore 117543;

    Singapore;

    Department of Electrical and Computer Engineering;

    National University of Singapore;

    Singapore 117583;

    Singapore;

    The Australian Research Council(ARC)Industrial Transformation Training Centre in Surface Engineering for Advanced Materials(SEAM);

    Swinburne University of Technology;

    P.O.Box 218;

    Hawthorn;

    VIC 3122;

    Australia;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 光电子技术、激光技术;
  • 关键词

    ultrathin; scattering; optics;

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