（Zr,V）N复合膜的结构、力学性能及摩擦性能研究

摘要

(Zr,V)N thin films with different V contents were deposited by reactive unbalanced magnetron sputtering. Their chemical compo-sition, microstructure, mechanical and tribological properties were investigated by EDS, XRD, XPS, nanoindentation and tribometer. The results indicated that the fcc crystal structure of ZrN has not been changed by adding vanadium added, but the preferential ori-entation of films change from (200) to (111). As the V contents increased, the hardness of (Zr,V)N thin films decreased slowly after increased slightly, and decreased rapidly when V contents increased over 25.8 at.%. With increasing V contents, the coefficient of friction of (Zr,V)N thin films decreased slightly. The V2O3 was firstly found in the film of (Zr,V)N at 300◦C and when the temperature was increased over 500 ◦C, the presence of V2O5 was found. Moreover, with the increase of the temperature the content of V2O5 increased, and the coefficient of friction of films decreased with the formation of V2O5.%　　通过非平衡磁控溅射的方法制备了不同V含量的(Zr,V)N复合薄膜,采用EDS, XRD, XPS,纳米压痕仪和摩擦磨损仪等对薄膜的化学成分、微结构、力学性能及摩擦性能进行了研究.结果表明, V的加入虽未改变ZrN的fcc晶体结构,但使薄膜的择优取向由ZrN的(200)面转变为(Zr,V)N的(111)面.随着V含量增加,(Zr,V)N复合膜的硬度略有升高后缓慢降低,并在含25.8 at.%V后迅速降低.与此同时,薄膜的常温摩擦系数亦有小幅降低.高温摩擦研究表明,(Zr,V)N薄膜在300◦C时出现V2O3, V2O5在500◦C后形成,其含量也随温度的提高而增加.薄膜的摩擦系数因V2O5的形成而得到显著降低.