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Integrated distributed feedback lasers and electroabsorption modulators fabricated using helium-plasma-assisted indium phosphide defect induced quantum well intermixing.

机译:使用氦-等离子体辅助磷化铟缺陷诱导的量子阱混合制造的集成分布式反馈激光器和电吸收调制器。

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摘要

An integrated DFB laser and electroabsorption modulator was fabricated by using a novel quantum-well-intermixing technique that uses the defects from a layer of InP grown by He-plasma-assisted gas source molecular beam epitaxy (He*-InP). This is the first investigation into the He*-InP defect induced intermixing, and the first time a device has been fabricated by using this technique.;The first part of this thesis outlines the first investigation into the effects of defects within a layer of He*-InP on annealing-induced quantum-well intermixing. Such a layer can be used to either decrease or increase the total amount of intermixing depending upon the placement of the He*-InP layer relative to the QW and the thickness of the layer. When the layer is far from the QW (∼0.5mum), the total amount of intermixing is decreased. When the layer is close to the QW, the total amount of intermixing can be increased as well as being accompanied by a reduction of the photoluminescence intensity. The main benefit of this intermixing technique is that, unlike dielectric-enhanced intermixing, it is possible to regrow over material that has been intermixed by the He*-InP defect.;The He*-InP defect-induced-intermixing technique has been applied to the fabrication of an integrated electroabsorption modulator and a distributed feedback laser. The techniques developed to fabricated the integrated device are discussed in detail in the second part of the thesis, followed by the device results. The device characteristics vary with device geometry. For example, the extinction ratios range from 9--16dB for voltage of 3V applied to a 400mum modulator due to the variation of the lasing wavelength with ridge width (for a 3QW structure). The threshold currents of discrete, 600mum long DFB lasers ranged from 18 to 35mA depending on its ridge width and where on wafer it was taken from.
机译:通过使用一种新颖的量子阱混合技术,制造了集成的DFB激光器和电吸收调制器,该技术利用了由He-等离子体辅助气体源分子束外延(He * -InP)生长的InP层中的缺陷。这是对He * -InP缺陷引起的混合的首次研究,也是首次使用这种技术制造器件。本论文的第一部分概述了对He层中缺陷影响的首次研究。 * -InP在退火诱导的量子阱混合中。根据He * -InP层相对于QW的位置和层的厚度,可以使用这种层来减少或增加混合的总量。当该层远离QW(〜0.5μm)时,混合的总量减少。当该层接近QW时,可以增加混合的总量以及伴随着光致发光强度的降低。这种混合技术的主要优点是,与介电增强混合不同,它可以使通过He * -InP缺陷进行了混合的材料重新生长。;已经应用了He * -InP缺陷诱导的混合技术。集成电吸收调制器和分布式反馈激光器的制造。在论文的第二部分中详细讨论了用于制造集成器件的技术,随后给出了器件结果。器件特性随器件几何形状而变化。例如,由于激射波长随脊宽的变化(对于3QW结构),对于施加到400mum调制器的3V电压,消光比范围为9--16dB。分立的600微米长的DFB激光器的阈值电流范围为18至35mA,具体取决于其脊宽和取自晶圆的位置。

著录项

  • 作者

    Letal, Gregory James.;

  • 作者单位

    McMaster University (Canada).;

  • 授予单位 McMaster University (Canada).;
  • 学科 Engineering Electronics and Electrical.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 147 p.
  • 总页数 147
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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