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Metal-induced unilaterally crystallized polycrystalline silicon thin-film transistor technology and application to flat-panel displays.

机译:金属诱导的单晶结晶多晶硅薄膜晶体管技术及其在平板显示器上的应用。

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摘要

High quality flat-panel displays (FPD) typically use active-matrix (AM) addressing, with the optical state of each pixel controlled by one or more active devices such as amorphous silicon (a-Si) thin film transistors (TFT). The successful examples are portable computer and liquid-crystal television (LC-TV). A high level of system on panel (SoP) electronic integration is required for versatile and compact systems. Meanwhile, many self-emitting display technologies are developing fast, active matrix for self-emitting display is typically current driven. The a-Si TFTs suffer from limited current driving capability, polycrystalline silicon (poly-Si) device technology is required. A new technology employing metal-induced unilaterally crystallization (MIUC) is presently reported. The device characteristics are obviously better than those in rapid-thermal annealed (RTA) and solid-phase crystallization (SPC) TFTs and the fabrication equipment is much cheaper than excimer laser crystallization (ELC) technology. The field effect mobility (μFE) of p- and n-channel MIUC TFTs is about 100cm2/Vs. Ion/I off is more than seven orders. Gate-induced leakage current in LT-MIUC poly-Si TFTs has been reduced by crystallization before heavy junction implantation to improve material quality and incorporating a gate-modulated lightly-doped drain (gamo-LDD) structure to reduce the electric field near the drain/channel junction region. At the same time, recrystallized (RC) MIUC TFT was researched with device characteristics improved. The 6.6cm 120 x 160 active matrix for OLED display is fabricated using LT-MIUC TFT technology on glass substrate. This display has the advantages of self-emitting, large intrinsic view angle and very fast response. At the same time, 6.6cm 120X160 AM-reflective twist nematic (RTN) display is fabricated using RC-MIUC TFT technology. This display is capable of producing 16 grade levels, 10:1 contrast and video image. The SOP display for AM-OLED were designed, fabricated and analysed, 30MHz peripheral driver circuits has been achieved using 5μm RC-MIUC TFTs.
机译:高质量平板显示器(FPD)通常使用有源矩阵(AM)寻址,每个像素的光学状态由一个或多个有源器件(例如非晶硅(a-Si)薄膜晶体管(TFT))控制。成功的例子是便携式计算机和液晶电视(LC-TV)。多功能,紧凑的系统需要高水平的面板上系统(SoP)电子集成。同时,许多自发光显示技术正在快速发展,用于自发光显示的有源矩阵通常由电流驱动。 a-Si TFT的电流驱动能力有限,因此需要多晶硅(poly-Si)器件技术。当前报道了一种采用金属诱导的单方结晶(MIUC)的新技术。器件特性明显优于快速热退火(RTA)和固相结晶(SPC)TFT,并且制造设备比准分子激光结晶(ELC)技术便宜得多。 p沟道和n沟道MIUC TFT的场效应迁移率(μ FE )约为100cm 2 / Vs。 I on / I off 超过七个订单。在重结注入之前通过晶化减少了LT-MIUC多晶硅TFT中栅极感应的漏电流,以提高材料质量,并采用栅极调制的轻掺杂漏极( gamo -LDD)结构减小漏极/沟道结区附近的电场。同时,研究了重结晶(RC)MIUC TFT,改善了器件的特性。用于OLED显示屏的6.6cm 120 x 160有源矩阵是使用LT-MIUC TFT技术在玻璃基板上制造的。该显示器具有自发光,大的固有视角和非常快的响应的优点。同时,使用RC-MIUC TFT技术制造了6.6厘米的120X160 AM反射扭曲向列(RTN)显示器。该显示器能够产生16级等级,10:1对比度和视频图像。设计,制造和分析了用于AM-OLED的SOP显示器,使用5μmRC-MIUC TFT实现了30MHz的外围驱动器电路。

著录项

  • 作者

    Meng, Zhiguo.;

  • 作者单位

    Hong Kong University of Science and Technology (People's Republic of China).;

  • 授予单位 Hong Kong University of Science and Technology (People's Republic of China).;
  • 学科 Engineering Electronics and Electrical.; Engineering Materials Science.; Physics Optics.
  • 学位 Ph.D.
  • 年度 2002
  • 页码 158 p.
  • 总页数 158
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;工程材料学;光学;
  • 关键词

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