首页> 外文学位 >Electron beam lithography for the fabrication of nanopillars in type II indium arsenide/gallium antimonide superlattices for multicolor infrared focal plane arrays.
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Electron beam lithography for the fabrication of nanopillars in type II indium arsenide/gallium antimonide superlattices for multicolor infrared focal plane arrays.

机译:电子束光刻技术,用于制造用于多色红外焦平面阵列的II型砷化铟/锑化镓超晶格中的纳米柱。

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摘要

Presently, there exists an important need for high-performance infrared photodetectors and focal plane arrays operating in the 8-12 mum atmospheric transmission window. Civilian applications that may require these devices include law enforcement, medical imaging, satellite communications and deep space astronomy. Military uses include night vision, target designation and long-range missile detection.; Currently, HgCdTe is the material standard for detectors and focal plane arrays in the mid to long wavelength infrared. However, due to concerns such as growth nonuniformity and device yield, researchers at the Center for Quantum Devices at Northwestern University have investigated other material systems that may eventually replace HgCdTe, such as InAs/GaSb type II superlattices. Through optimization of growth techniques and material quality, the performance of these devices has become comparable to state of the art HgCdTe detectors.; This work describes the theoretical basis and motivation for nanostructures in type II InAs/GaSb materials as well as the fabrication of nanometer-scale type II superlattice structures for eventual use in multicolor infrared detector applications. Using electron beam lithography and reactive ion etching, significant fabrication advances are shown while patterning structures down to less than 20 nm diameter with 10:1 aspect ratios in the GaInAs, GaInP, GaSb and InAs/GaSb material systems. Photoluminescence experiments indicate the strong possibility of carrier confinement and quantum size effects. Furthermore, device fabrication steps for experimental testing of nanopillar characteristics have been developed and detailed. Electrical measurements have been performed temperatures down to 30 K. Finally, optical response from nanopillar devices in the GaInAs/InP QWIP material system has been demonstrated with detectivity of approximately 3x108 Jones at 30K and wavelength response of about 8.5 mum. This is the first demonstration of optical response from nanopillar arrays in this material system. Dark current and responsivity data has been fit to theoretical models in order to understand the physical phenomena that contribute to device performance. Prospects for future work in this field are also discussed.
机译:当前,非常需要在8-12毫米大气透射窗口中工作的高性能红外光电探测器和焦平面阵列。可能需要这些设备的民用应用包括执法,医学成像,卫星通信和深空天文学。军事用途包括夜视,目标指定和远程导弹探测。目前,HgCdTe是中长波长红外探测器和焦平面阵列的材料标准。但是,由于诸如生长不均匀性和器件产量等问题,西北大学量子器件中心的研究人员研究了可能最终替代HgCdTe的其他材料系统,例如InAs / GaSb II型超晶格。通过优化生长技术和材料质量,这些设备的性能已经可以与最新的HgCdTe检测器相媲美。这项工作描述了II型InAs / GaSb材料中纳米结构的理论基础和动机,以及最终用于多色红外探测器应用的纳米级II型超晶格结构的制造。在GaInAs,GaInP,GaSb和InAs / GaSb材料系统中,使用电子束光刻和反应离子刻蚀技术,可以显示出显着的制造进展,同时可以以10:1的纵横比对直径小于20 nm的结构进行构图。光致发光实验表明载流子限制和量子尺寸效应的可能性很大。此外,已经开发并详细描述了用于纳米柱特性的实验测试的器件制造步骤。已经在低至30 K的温度下进行了电学测量。最后,已经证明了GaInAs / InP QWIP材料系统中纳米柱器件的光学响应,在30K时的探测灵敏度约为3x108 Jones,波长响应约为8.5 mum。这是该材料系统中纳米柱阵列光学响应的​​首次演示。为了了解有助于器件性能的物理现象,暗电流和响应度数据已适合理论模型。还讨论了该领域未来工作的前景。

著录项

  • 作者

    Gin, Aaron Vincent.;

  • 作者单位

    Northwestern University.;

  • 授予单位 Northwestern University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 242 p.
  • 总页数 242
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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