首页> 外文学位 >Growth and characterization of molybdenum disulfide, molybdenum diselenide, and molybdenum(sulfide, selenide) formed between molybdenum and copper indium(sulfide, selenide) during growth.
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Growth and characterization of molybdenum disulfide, molybdenum diselenide, and molybdenum(sulfide, selenide) formed between molybdenum and copper indium(sulfide, selenide) during growth.

机译:二硫化钼,二硒化钼和钼与铜铟(硫化物,硒化物)之间形成的钼(硫化物,硒化物)的生长和表征。

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摘要

CuIn(Sx,Se1-x)2 is a member of the semiconductor family Cu(Inx,Ga1-x)(Sy,Se1-y) 2 used in thin film photovoltaics. During the formation of a CuIn(S x,Se1-x)2 film, an interfacial layer is created between the semiconductor bulk film and the molybdenum back contact. Structural and chemical properties of the MoCuIn(Sx,Se1-x) 2 were evaluated for CuInSe2, CuInS2, and CuIn(S x,Se1-x)2 films grown by multi-source elemental evaporation. Mo films were reacted in H2S, H2Se, and a mixed H2S/H2Se gas to provide a baseline comparison for the reaction during the growth of the CuIn(Sx,Se1-x) 2 films.; Chemical and structural analysis was performed using Electron Dispersive Spectroscopy (EDS), X-Ray Diffraction (XRD), and Glancing Angle X-Ray Diffraction (GIXRD). The interface between Mo and the semiconductor films was exposed by separating the glass and molybdenum from the semiconductor film. Independent measures were made on the bulk films and on the newly exposed Mo and semiconductor surfaces.; At 550°C Mo reacts with H2Se to form MoSe2. MoSe2 was seen at the interface between Mo and CuIn(Sx,Se 1-x)2 and between Mo and CuInSe2. The reaction of Mo with H2S was much slower and a very thin layer of material was detected, presumably MoS2. A similar thin layer of material was seen at the interface between Mo and CuInS2 but it is not known definitively at this time whether this layer is MoS2 or MoSe 2. Only MoSe2 was seen when the gas mixed was used.
机译:CuIn(Sx,Se1-x)2是薄膜光伏中使用的半导体族Cu(Inx,Ga1-x)(Sy,Se1-y)2的成员。在形成CuIn(S x,Se1-x)2膜期间,在半导体本体膜和钼背接触之间形成界面层。对于通过多源元素蒸发生长的CuInSe2,CuInS2和CuIn(S x,Se1-x)2膜,评估了MoCuIn(Sx,Se1-x)2的结构和化学性质。 Mo膜在H2S,H2Se和混合的H2S / H2Se气体中反应,以提供CuIn(Sx,Se1-x)2膜生长过程中反应的基线比较。化学和结构分析是使用电子分散光谱(EDS),X射线衍射(XRD)和掠射角X射线衍射(GIXRD)进行的。 Mo和半导体膜之间的界面通过将玻璃和钼与半导体膜分离而暴露。在块状薄膜以及新暴露的钼和半导体表面上采取了独立的措施。 Mo在550°C下与H2Se反应形成MoSe2。 MoSe2在Mo与CuIn(Sx,Se 1-x)2之间以及Mo与CuInSe2之间的界面处可见。 Mo与H2S的反应要慢得多,并且检测到非常薄的材料层,大概是MoS2。在Mo和CuInS2之间的界面处可以看到类似的薄材料层,但目前尚不确定该层是MoS2还是MoSe2。使用混合气体时只能看到MoSe2。

著录项

  • 作者

    Rickman, Sarah.;

  • 作者单位

    University of Delaware.;

  • 授予单位 University of Delaware.;
  • 学科 Engineering Materials Science.
  • 学位 M.M.S.E.
  • 年度 2006
  • 页码 85 p.
  • 总页数 85
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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