首页> 外文会议>Symposium on New Applications for Wide-Bandgap Semiconductors; 20030422-20030424; San Francisco,CA; US >Modulation of Energy Band Gap of ZnO Thin Films Grown by Pulsed Laser Deposition
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Modulation of Energy Band Gap of ZnO Thin Films Grown by Pulsed Laser Deposition

机译:脉冲激光沉积生长ZnO薄膜的能带隙的调制

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摘要

ZnCdO thin films were deposited on (001) sapphire substrates by pulsed laser deposition. Modulation of the energy band gap of ZnCdO was induced by changing the processing parameters. The optical energy band gap of ZnCdO thin films, measured by photoluminescence and transmittance, changed from 3.289 eV to 3.311 eV due to the variation of annealing temperatures. The change of the optical properties was attributed to the change of the stoichiometry of Zn_xCd_(1-x)O as illustrated by Rutherford backscattering spectroscopy.
机译:ZnCdO薄膜通过脉冲激光沉积法沉积在(001)蓝宝石衬底上。通过改变工艺参数来诱导ZnCdO的能带隙调制。由于退火温度的变化,通过光致发光和透射率测量的ZnCdO薄膜的光能带隙从3.289 eV变为3.311 eV。光学性质的变化归因于Zn_xCd_(1-x)O的化学计量的变化,如卢瑟福背散射光谱法所示。

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