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Plasma Modification at Atmispheric Pressure

机译:大气压下的等离子体改性

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摘要

Many useful processes for treating solid surfaces can be carried out by plasma methods. However, most previous work was done at low pressure, usually less than a few torr. For such low pressure processes, the vacuum apparatus requires great cost and is not suitable or the treatments of large cscale substrates such as long film rolls. We previously reported that surface fluorination and thin film deposition could be carried out with the atmosp heric pressure glow plasma(APG0 process(1). This approach can reduce apparatus costs and can also be applied ot high vapor pressure substances such as gum, textiles and biomaterials. In this article, we will discuss the mechanism of stabilization of glow plasma at atmospheric pressure and report examples of applications of this technology.
机译:可以通过等离子体方法进行许多有用的处理固体表面的方法。但是,以前的大多数工作都是在低压下完成的,通常小于几个托。对于这样的低压过程,真空设备需要很高的成本并且不适合用于大型c规模的基材(例如长薄膜卷)的处理。先前我们曾报道,可以使用大气压力辉光等离子体(APG0工艺(1))进行表面氟化和薄膜沉积,这种方法可以降低设备成本,还可以应用于高蒸气压物质,例如口香糖,纺织品和在本文中,我们将讨论大气压下辉光等离子体的稳定机理,并报告该技术的应用实例。

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