Mechanism in Plama Enhanced Chemical Vapour Deposition Form Organosilicon Feeds

摘要

Organosilane-oxygen mixtures are widely utilised for plasma enhanced chemical vapour deposition (PE-CVD) of thin films for different applications, such as CR-39 ophthalmic lenses protection coatings with anti-scratc properties (1,2), barrier films for food and pharmaceutical packaging (30, corrosion protection layers (4), coatings for biocompatible materials, and dielectric layers in microelectronics application. Some of the most utilised organosilanes are e.g. hexamethyldisiloxane (HMDSO) tetraethoxisilane (TEOS), tetramethyldisiloxane (TMDSO), hexamethyldisilazane (HMDSN). This is a field in which the work is progressing rather slowly, with a few noticeable exceptions, such as the studies of SEGUI ET AL (5,6, see also this book), for IR diagnostics (7) of gas phase product, the papers by Flamm (8,9) for the deposition mechansim when condorm coatings of SiO_2 films are formed, those by d'Agostino et al. (10,11) for the effect of substrate bias, the works of Wertheimer and Wrolbel (12) for the deposition emchanism, when plasma induced polymerisation can be thought to be the most important route (i.e. relatively high pressure conditions).