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HYDROGEN ABSORPTION AND DESORPTION BEHAVIOR WITH A BORONIZED WALL

机译:渗硼墙的氢吸收和解吸行为

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摘要

A systematic study on hydrogen behavior with boronized walls has been carried out. Hydrogen in boron films can be completely removed below 400℃ in a pure boron film, This is not significantly changed with a boron film fully contaminated by oxygen. Strong absorption of hydrogen by a hydrogen-depleted boron film is seen just after start of hydrogen/glow discharge. Absorption during the discharge is not completely saturated with time, even after 10 hours. Behavior of hydrogen pressure just after the termination of the glow discharge suggests so called "dynamic retention". It is comparable to saturated retention. The dynamic behavior can be reproduced with a simple model, in which trapping, detrapping, recombination processes are included.
机译:对含硼壁的氢行为进行了系统的研究。低于400℃的纯硼膜可以完全除去硼膜中的氢,而被氧完全污染的硼膜则不会显着改变。刚开始氢/辉光放电后,就可以看到贫氢硼薄膜对氢的强烈吸收。即使在10小时后,放电过程中的吸收也不会随时间完全饱和。辉光放电终止后的氢气压力行为暗示了所谓的“动态保持”。它与饱和保留相当。可以使用简单的模型来复制动态行为,其中包括捕获,分离和重组过程。

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