首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Development of the Automatic Recipe Generation System for CD-SEM Using Design Data
【24h】

Development of the Automatic Recipe Generation System for CD-SEM Using Design Data

机译:利用设计数据开发CD-SEM自动配方生成系统

获取原文
获取原文并翻译 | 示例

摘要

This study examines the "Multifactor Layout Analysis Method: MLA Method" newly developed for automatically detecting an appropriate addressing point and an auto focus point in the automatic generation of a measurement recipe for CD-SEM using design data. The MLA method is a unique pattern shape evaluation method capable of searching for the optimum addressing and auto focus points with a higher speed and accuracy than by the conventional methods, depending on the detailed information about the shape of a semiconductor pattern, which is contained in the design data. A recipe using the result of search by the MLA method has the same performance as that of a recipe generated by an experienced operator. This paper outlines the MLA method and reports on the result of experiments by this method and its practical applicability.
机译:这项研究检查了新开发的“多因素布局分析方法:MLA方法”,该方法用于在使用设计数据自动生成CD-SEM的测量配方时自动检测适当的寻址点和自动焦点。 MLA方法是一种独特的图形形状评估方法,能够根据包含在半导体图形中的有关半导体图形形状的详细信息,以比传统方法更高的速度和精度来搜索最佳寻址和自动对焦点。设计数据。使用通过MLA方法搜索的结果的配方具有与经验丰富的操作员生成的配方相同的性能。本文概述了MLA方法,并报告了使用该方法的实验结果及其实际适用性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号