首页> 外文会议>Chinese Automation Congress >Dual Loop Feedforward Control for Czochralski Silicon Single Crystal Growth
【24h】

Dual Loop Feedforward Control for Czochralski Silicon Single Crystal Growth

机译:双环前馈控制直拉硅单晶生长

获取原文

摘要

A control system of Czochralski silicon single crystal growth based on lumped parameter model is designed in this paper. The control system includes a lumped parameter model that involving the hydrodynamics-geometry and thermodynamic systems. The lumped parameter model is established by the equilibrium equation of the solid-liquid interface of the thermodynamic subsystem, and including the modeling of crystal radius, slope angle and meniscus shape. The pulling speed feedforward control determines the growth rate of the reference and reduces the influence of the meniscus shape on system parameters. The feedforward control of the heater improves the calculation accuracy of the main process parameter and, combined with the feedback control, ensures high quality of the most important variables such as the diameter and the growth rate. In addition, the dependence of the growth rate and crystal shape on the feedforward control of the heater is analyzed.
机译:本文设计了一种基于集总参数模型的直拉硅单晶生长控制系统。该控制系统包括一个集总参数模型,该模型涉及流体动力学几何和热力学系统。集总参数模型是由热力学子系统的固液界面平衡方程建立的,包括对晶体半径,倾斜角和弯月面形状的建模。拉动速度前馈控制确定参考值的增长率,并减少弯月面形状对系统参数的影响。加热器的前馈控制提高了主要工艺参数的计算精度,并且与反馈控制相结合,可确保最重要的变量(例如直径和增长率)的高质量。另外,分析了生长速率和晶体形状对加热器的前馈控制的依赖性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号