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Consolidation of the control system of a chemical polishing machine for superconducting RF cavities using the UNICOS-CPC framework

机译:使用UNICOS-CPC框架整合用于超导RF腔的化学抛光机的控制系统

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It is common for industrial installations to be in operation for several decades, which means that upgrading the control systems of these plants is an imperative for several reasons. As new hardware and software solutions become available, spares are increasingly hard to find and technical support for the old hardware is dropped by the vendors. Lost or non-existing documentation turns usage by new operators needlessly hard and maintenance work or modifications nearly impossible. This paper deals with one such case: the upgrade process of the control system for the Chemical Polishing machine used at CERN for the surface treatment of superconducting RF cavities. It was developed back in 1989, based on Siemens S5 PLCs and a custom HMI. In order to guarantee a smooth and swift transition, CERN's own framework for process control (UNICOS-CPC) was used to develop a new control system, based in current Siemens control solutions. Ideally, this study may serve as a starting point for other engineers dealing with a similar situation.
机译:工业设备通常要运行几十年,这意味着由于多种原因,必须升级这些设备的控制系统。随着新的硬件和软件解决方案的出现,备件越来越难找到,并且供应商放弃了对旧硬件的技术支持。丢失或不存在的文档使新操作员不必要地辛苦使用,并且几乎不可能进行维护工作或修改。本文涉及一种情况:CERN用于超导RF腔表面处理的化学抛光机控制系统的升级过程。它是在1989年基于西门子S5 PLC和自定义HMI开发的。为了保证平稳,快速的过渡,使用了CERN自己的过程控制框架(UNICOS-CPC)来开发基于当前西门子控制解决方案的新控制系统。理想情况下,该研究可以作为其他处理类似情况的工程师的起点。

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