首页> 外文会议>Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International >Surface acoustic wave propagation on piezoelectric substrates with thin-film PECVD silicon nitride
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Surface acoustic wave propagation on piezoelectric substrates with thin-film PECVD silicon nitride

机译:表面声波在带有薄膜PECVD氮化硅的压电基板上的传播

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The SAW characteristics of thin-film silicon nitride (Si/sub 3/N/sub 4/) on piezoelectric substrates of Y-Z and 64/spl deg/ Y-X lithium niobate, and 36/spl deg/ Y-X lithium tantalate have been measured in the frequency range from 30 MHz to above 1.0 GHz. Silicon nitride films 250, 500, and 1000 nm thick were deposited by plasma enhanced chemical vapor deposition (PECVD). The SAW velocity and propagation loss properties were measured using linear arrays of thin-film aluminum interdigital electrodes patterned on the upper film surface. The elastic constants of the films could be determined by fitting a theoretical velocity dispersion curve to the measured velocities for Rayleigh wave propagation. The SAW propagation loss values for the films on the different substrates were compared to the loss characteristics without the film layers. Temperature coefficient of frequency (TCF) measurements of the SAW velocity characteristics for the various film/substrate combinations were also made. The results of these measurements, comparative data on acoustic constants, and the performance enhancements for SAW devices which could be realized by the use of silicon nitride on piezoelectric substrates are discussed.
机译:已在YZ和64 / spl deg / YX铌酸锂和36 / spl deg / YX钽酸锂的压电基板上测量了薄膜氮化硅(Si / sub 3 / N / sub 4 /)的SAW特性。频率范围从30 MHz到1.0 GHz以上。通过等离子体增强化学气相沉积(PECVD)沉积250、500和1000nm厚的氮化硅膜。使用在上膜表面上图案化的薄膜铝叉指电极的线性阵列来测量SAW速度和传播损耗特性。膜的弹性常数可以通过将理论速度色散曲线与瑞利波传播的测得速度拟合来确定。将在不同基板上的薄膜的SAW传播损耗值与没有薄膜层的损耗特性进行比较。还对各种膜/基材组合的SAW速度特性进行了频率温度系数(TCF)测量。讨论了这些测量的结果,声学常数的比较数据以及SAW器件的性能增强,这些性能可以通过在压电基板上使用氮化硅来实现。

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