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Development of high efficiency rear-emitter n-type silicon heterojunction solar cells

机译:高效背发射n型硅异质结太阳能电池的开发

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Amorphous silicon/crystalline silicon heterojunction solar cells have high open-circuit voltages (Voc) due to excellent passivation on n-type wafer surfaces by thin intrinsic amorphous silicon layers. In this paper, we focus on development of high efficiency rear-emitter heterojunction solar cells using n-type silicon wafers, mainly in three aspects: 1) intrinsic amorphous silicon layer optimization for obtaining superior wafer surface passivation, 2) n-type amorphous silicon film optimization, as a window layer, for high Voc and fill factor (FF), and 3) transparent conductive oxide (TCO) layer development for high transmittance and well balancing between short-circuit current density (Jsc) and FF. After process optimization, we attained 21.7% certified efficiency on a 152.3cm2 n-type silicon wafer with Jsc of 38.25mA/cm2 and Voc of 721mV.
机译:非晶硅/晶体硅异质结太阳能电池具有很高的开路电压(Voc),这是由于薄的本征非晶硅层在n型晶片表面上具有极好的钝化作用。在本文中,我们重点研究使用n型硅晶片的高效后发射极异质结太阳能电池的开发,主要在三个方面:1)优化本征非晶硅层以获得优异的晶片表面钝化; 2)n型非晶硅薄膜优化,作为窗口层,以获得高Voc和填充因子(FF),以及3)开发透明导电氧化物(TCO)层,以实现高透射率以及短路电流密度(Jsc)和FF之间的良好平衡。经过工艺优化后,我们在152.3cm2的n型硅晶片上获得了21.7%的认证效率,Jsc为38.25mA / cm2,Voc为721mV。

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