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Contact resistance measurement - observations on technique and test parameters

机译:接触电阻测量-对技术和测试参数的观察

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During testing of a new contact resistance measurement system (ContactSpot), we observed several unexpected results. TLM theory predicts a linear dependence of the resistance measurements vs probe spacing, and from this data set the contact resistance can be extracted. However, we found a non-linearity at wider probe spacing as well as sensitivities to the magnitude of the current, the direction of current flow, the ambient light level, and the choice of using contact pitch or spacing distances in the algorithm. Little appears in the literature concerning these effects and sensitivities. We found acceptable conditions for performing the TLM method in the dark, but we found more consistent results for contact resistance and emitter sheet resistivity values when using a previously developed algorithm that does not depend upon calculating slope and intercept values.
机译:在测试新的接触电阻测量系统(ContactSpot)期间,我们观察到了一些出乎意料的结果。 TLM理论预测电阻测量值与探头间距之间的线性相关性,并且可以从该数据集中提取接触电阻。但是,我们发现在较宽的探头间距处存在非线性,并且对电流的大小,电流的方向,环境光水平以及在算法中使用接触间距或间距的选择敏感。关于这些作用和敏感性的文献很少。我们找到了在黑暗中执行TLM方法的可接受条件,但是当使用不依赖于计算斜率和截距值的先前开发的算法时,我们发现接触电阻和发射极薄层电阻率值的结果更加一致。

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