首页> 外文会议>2011 8th IEEE International Conference on Group IV Photonics >Fabrication of high-Q silicon-based three-dimensional photonic crystal nanocavity and its lasing oscillation with InAs quantum-dot gain
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Fabrication of high-Q silicon-based three-dimensional photonic crystal nanocavity and its lasing oscillation with InAs quantum-dot gain

机译:高Q硅基三维光子晶体纳米腔的制备及其InAs量子点增益的激光振荡

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We fabricated a silicon-based three-dimensional photonic crystal nanocavity by micromanipulation technique, exhibiting a high quality factor of ∼14,500. Lasing oscillation with an InAs/GaAs quantum-dot layer inserted in the cavity was successfully demonstrated at 11K.
机译:我们通过微操作技术制造了硅基三维光子晶体纳米腔,其品质因数约为14,500。在11K下成功演示了在腔中插入InAs / GaAs量子点层的激光振荡。

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