首页> 外文会议>22nd IEEE International Semiconductor Laser Conference >Lasing properties of monolithically integrated Ga(NAsP)/(BGa)P QW lasers on a silicon substrate grown by MOVPE
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Lasing properties of monolithically integrated Ga(NAsP)/(BGa)P QW lasers on a silicon substrate grown by MOVPE

机译:在MOVPE生长的硅衬底上单片集成Ga(NAsP)/(BGa)P QW激光器的激光特性

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摘要

Lasing operation up to 120K is reported for direct band-gap GaNAsP grown monolithically on a silicon substrate. Jth=0.81kAcm−2 is measured at 80K with a To of 97K from 40–120K for a HR coated device.
机译:对于在硅衬底上整体生长的直接带隙GaNAsP,据报道激光操作高达120K。对于HR涂层设备,J = 0.81kAcm −2 在80K下测量,T o 在40-120K之间,为97K。

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