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Effects of XeCl excimer lasers and fluoride application on artificial caries-like lesions

机译:XeCl准分子激光和氟化物对人造龋齿样病变的影响

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Abstract: In this study the affects of a pulsed excimer laseremitting at 308 nm (XeCl) on enamel susceptibility toartificial caries-like lesions were investigated.Additional effects of fluoride (F) application werealso studied and SEC examinations performed. Sixty-fourextracted human molar teeth were coated with acidresistant varnish leaving four windows, then sectioned,leaving one window on each tooth quarter. The windowswere treated in one of the following ways: untreated(control), or lased, or exposed to 4 min. APF (1.23% F)before lasing, or exposed to 4 min. APF (1.23% F) afterlasing. After lasing, microhardness profiles wereobtained and SEM was performed. Caries resistance wasgenerally increased at moderate fluences. F applicationcombined with lasing enhanced caries resistance at someparameters. SEM showed effects ranging from minimal tolocalized effects to extended glazing. Pulsed excimerlaser irradiation, especially combined with topical Fapplication can inhibit development of artificialcaries-like lesions. !10
机译:摘要:这项研究研究了308 nm脉冲准分子激光(XeCl)对龋齿样病变的牙釉质敏感性的影响,还研究了氟化物(F)的附加作用并进行了SEC检查。用抗酸清漆对64颗提取的人类磨牙进行涂覆,留下四个窗口,然后切成薄片,每个牙齿四分之一留下一个窗口。以下列方式之一对窗户进行处理:未处理(对照),激光发射或暴露4分钟。激光发射或暴露4分钟后的APF(1.23%F)。 APF(1.23%F)激光发射。激光照射后,获得显微硬度分布并进行SEM。一般情况下,中等耐力时,龋齿抵抗力通常会增加。 F施用与激光在某些参数下增强了抗龋性。 SEM显示了从最小到局部的影响到延长的玻璃的影响。脉冲准分子激光照射,特别是与局部F照射相结合,可以抑制人造龋齿样病变的发展。 !10

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