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Low resistive ZnSe substrates

机译:低电阻ZnSe基板

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Doping by annealing of ZnSe single crystals grown by solid phase recrystallisation in a mixture of Al and Zn at 860 deg C has been studied. The properties of doped ZnSe crystals assessed by secondary ions mass spectroscopy, scanning electron microscopy (electron channelling patterns (ECP) and cathodoluminescence (CL)), double crystal X-ray diffraction (rocking curve) and Hall effect measurements depend strongly on the geometry of the crystal which is annealed. In the best case, CL spectra show only the donor-bound exciton line (2.67 eV at 300 K; 2.77 eV at 100 K) indicating thus, together with ECP and rocking curve FWHM (35 arcsec), the high crystalline quality of the(1 0 0)-doped substrates. From Hall effect measurements, a free electron cncentration of 5 X 10~17 cm~-3 and an electron mobility of 200 cm~2V~-1s~-1(resistivity 6.3 X 1-~-2 #OMEGA# cm) at 300 K are determined. direct c 1999 Elsevier Science B.V. All rights reserved.
机译:已经研究了通过在860℃下在Al和Zn的混合物中通过固相重结晶生长的ZnSe单晶退火进行掺杂。通过二次离子质谱,扫描电子显微镜(电子沟道图(ECP)和阴极发光(CL)),双晶X射线衍射(摇摆曲线)和霍尔效应测量来评估掺杂的ZnSe晶体的性能在很大程度上取决于硅的几何形状。退火的晶体。在最佳情况下,CL光谱仅显示供体结合的激子线(300 K时为2.67 eV; 100 K时为2.77 eV),从而表明,连同ECP和摇摆曲线FWHM(35 arcsec),( 1 0 0)掺杂的基板。根据霍尔效应测量,在300°C时自由电子浓度为5 X 10〜17 cm〜-3,电子迁移率为200 cm〜2V〜-1s〜-1(电阻率6.3 X 1-〜-2#OMEGA#cm)确定K。直接c 1999 Elsevier Science B.V.保留所有权利。

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