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Thermal stability enhancement of photochromic holograms

机译:光致变色全息图的热稳定性增强

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摘要

Significant enhancement of the thermal stability of the hologram recorded on photochromic materials had been achieved via covalent bonding of the photochromic dye to the polymer matrix as compared to the host-guest systems. One time partial reduction of the hologram's initial diffraction efficiency due to thermal exposure was observed for both -polymers with attached dye as well as host-guest materials. Such one time reduction is interpreted to be due to the thermal relaxation of the polymer network induced with photochromic transition in the dye molecule. A gradual hologram erasure at elevated temperatures was observed for the host-guest system, which is assumed to be due to dye's diffusion between highly lit and dark areas. At temperatures ca. 100 ℃ there was no detectable diffusion type degradation of the hologram after 6 hours of exposure to elevated temperature. Same heating of the hologram in photochromic host-guest polymer led to a full hologram erasure within 40 minutes. In both cases the one time reduction of the diffraction efficiency (DE) due to matrix relaxation and heat adjustment had comparable value of about 0.5 of hologram's initial DE.
机译:与主体-客体系统相比,通过将光致变色染料与聚合物基质共价键合,已大大提高了记录在光致变色材料上的全息图的热稳定性。对于具有附着染料的聚合物以及客体材料,均观察到由于热暴露而使全息图的初始衍射效率部分降低。认为这种减少的时间是由于染料分子中的光致变色转变引起的聚合物网络的热弛豫。观察到宿主-客体系统在高温下逐渐消失了全息图,这被认为是由于染料在高亮和暗区之间的扩散所致。在大约温度下。暴露于高温6小时后,没有发现全息图的100℃扩散型降解。在光致变色客体聚合物中对全息图进行相同加热会导致在40分钟内完全擦除全息图。在这两种情况下,由于基质弛豫和热调节引起的衍射效率(DE)的一次降低具有可比较的约为全息图初始DE的0.5的值。

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