Tools and Processes for MEMS and Nanotechnology

摘要

Research into Microelectromechanics (MEMS) and Nanotechnology covers the range of feature dimensions from sub-millimetre to nanometre scales. It relies upon tools and processes for lithography and pattern transfer drawn largely but not exclusively from the silicon semiconductor industry. Optical lithography systems, particle beam nanowriter tools and X-ray sources may be regarded as the 'machine tools' for MEMS and Nanotechnology, each with their unique advantages and limitations. They are being exploited for R&D applications ranging from customized MEMS to vacuum microelectronics and novel nanotools such as electron microcolumns and multiple tip scanning probe systems.