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Neutron transmutation doped far-infrared p-Ge laser

机译:中子trans杂掺杂远红外p-Ge激光器

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摘要

Far-infrared p-Ge laser operation in an active crystal prepared by transmutation doping is demonstrated for the first time. Though saturated current density in the prepared active crystal is twice lower than optimal, the laser performance is comparable to that of good lasers made from commercially produced melt grown p-Ge. The current saturation behavior of this material confirms the expected higher doping uniformity over melt grown laser rods.
机译:首次展示了通过trans变掺杂制备的活性晶体中的远红外p-Ge激光操作。尽管所制备的活性晶体中的饱和电流密度比最佳情况低两倍,但其激光性能可与由商业生产的熔融生长的p-Ge制成的优质激光器相媲美。该材料的电流饱和行为证实了与熔融生长的激光棒相比预期的更高的掺杂均匀性。

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