High Yield Photo-lithography Using Spray Coating

摘要

This paper describes the various applications that have been discovered for the use of sprayrncoating. This process was initially developed for the coating of substrates with challengingrnsurface topographies, and for conformal coating of these topographies. It has also beenrndiscovered that the technology is of use for coating non-circular substrates and multiplernsubstrates simultaneously. Additionally, spray coating has demonstrated the ability torneffectively provide protective coating for delicate structures.