Opportunities For Micro/Nanostructures Research AndDevelopment Using Synchrotron X-Ray Lithography At TheCanadian Light Source

摘要

Synchrotron deep X-ray lithography (DXRL) uses collimated synchrotron "hard" X-raysrnwith short wavelength (typically 0.1-1.2 nm) to realize precise, micro and nano-scalernpatterning and deep penetration in thick X-ray sensitive resists over large exposure areas.rnDXRL combined with a technique called LIGA (a German acronym for XRL,rnelectroplating, and replication using precision moulds) has the potential to provide lowcost,rnhigh accuracy replication possibilities of these micro and nano-scale structures in arnvariety of materials supporting volume fabrication. Some initial results of collaborativernresearch activity in DXRL-MEMS for wireless telecom applications involvingrnresearchers from the University of Saskatchewan, Telecommunications Research Labsrn(TRLabs), and the Institute of Microstructure Technology (IMT) at ForschungszentrumrnKarlsruhe (FZK), Germany are presented. A brief status update on the "CanadianrnSynchrotron Nanostructures Facility (CSNF)", an XRL facility proposed for thernCanadian Light Source (CLS) synchrotron, is also presented.