首页> 外文会议>5th International Symposium on Test and Measurement (ISTM/2003) Vol.1 Jun 1-5, 2003 Shenzhen, China >The Analysis of Acting Force between the Surface of Ice Desk and Metal in Nano-Level Polish Machining
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The Analysis of Acting Force between the Surface of Ice Desk and Metal in Nano-Level Polish Machining

机译:纳米级抛光加工中冰台表面与金属的作用力分析

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摘要

According to the experimental result that the icy plate polish machining can realize nano-level of the surface roughness, we begin with Physics of Surfaces, In the level of the microcosmic atom and molecule, Analyzed as Well the state, defect of the surface and interface of the ice desk and the Metal test piece as acting force, surface energy, deformation and so on in the process of polish between the surface of contact. Furthermore, we analyzed and discussed the mechanism that the ice desk polishing on metal materials can realize the nano-level removal.
机译:根据冰冷抛光可以实现纳米级表面粗糙度的实验结果,我们从表面物理学入手,从微观原子和分子的水平入手,还分析了表面和界面的状态,缺陷。冰柜和金属试件的作用是在接触表面之间的抛光过程中作用力,表面能,变形等。此外,我们分析并讨论了在金属材料上进行冰台抛光可以实现纳米级去除的机理。

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