首页> 外文会议>5th International Symposium on Test and Measurement (ISTM/2003) Vol.1 Jun 1-5, 2003 Shenzhen, China >Luminescent properties of ZnTe film grown on silicon substrate with ZnO buffer layer
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Luminescent properties of ZnTe film grown on silicon substrate with ZnO buffer layer

机译:在带有ZnO缓冲层的硅衬底上生长的ZnTe薄膜的发光特性

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摘要

Growth and optical properties of ZnTe film on ZnO buffered Si substrate using metal-organic vapor phase epitaxy technique (MOVPE) were reported. With increasing the annealing temperature of ZnO buffer layer, the crystallization of ZnTe assessed by X-ray diffraction is improved. Temperature-dependent photoluminescence spectra of the ZnTe film can be divided into two temperature regions. The dominants emission is binding excitons from 83K to 157K, While above 157K, the binding excitons are delocalized to become free excitons, and free excitons emission becomes dominant.
机译:利用金属有机气相外延技术(MOVPE)报道了ZnTe缓冲Si衬底上ZnTe薄膜的生长和光学性质。随着ZnO缓冲层退火温度的升高,通过X射线衍射评估的ZnTe结晶度得到改善。 ZnTe薄膜的随温度变化的光致发光光谱可分为两个温度区域。显性发射是从83K到157K的结合激子,而在157K以上时,结合的激子离域成为自由激子,自由激子发射成为主导。

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